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With the increasing integration density of large-size wafers in semiconductor devices, a mirror-like silicon surface free from damage, haze, heavy metal contamination, grease, and nano-morphology is essential. Fujimi Corporation's GLANZOX series is designed to meet this requirement. GLANZOX polishing agents consist of colloidal silica dispersed in a liquid composed of special ingredients. This product achieves a near-perfect polished surface. Recently, to meet the requirement of significantly reducing metal impurities that affect device performance, we have developed an even higher level of polishing agent.