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COMPOL is composed of high-purity colloidal silica microparticles with a particle size of only tens of nanometers, combined with FUJIMI's patented suspension rust inhibitor and other ingredients. It ensures a scratch-free, mirror-like finish on machined parts. It is particularly suitable for the final polishing of electronic materials such as potassium sapphire, potassium sulfate, and sapphire, achieving a ready-to-use standard. It is also widely used for the fine polishing of various nonlinear optical crystals, laser crystals, and the final fine polishing of high-hardness alloy molds, special ceramics, computer glass disk substrates, etc.